Apparatus for manufacturing a broadband cholesteric polarizer

ABSTRACT

The Application describes a method and devices for manufacturing a broadband cholesteric polarizer having a well-defined bandwidth and edge position. To this end, a liquid-crystalline cholesterically ordered layer comprising reactive chiral monomers and reactive nematogenic monomers having a different reactivity is polymerized by exposure to radiation. The invention is characterized in that the intensity of the radiation is increased substantially, preferably by a factor of 10 or more, when a desired edge position of the band is reached. As a result, the bandwidth and edge position of the reflection band reached at that moment are frozen as it were. A monochromatic sensor can be used to determine whether said edge position has been reached, the wavelength used by the sensor corresponding to the wavelength of the desired edge position of the band. Broadband, cholesteric polarizers having a well-defined bandwidth and edge position can very advantageously be used in a display.

CROSS REFERENCE TO RELATED APPLICATIONS

This is a divisional of application Ser. No. 08/911,078, filed Aug. 14,1997 now U.S. Pat. No. 5,948,831.

BACKGROUND OF THE INVENTION

The invention relates to apparatus for manufacturing a broadbandcholesteric polarizer, in which a liquid-crystalline, cholestericallyordered layer comprising reactive chiral monomers and reactivenematogenic monomers of different reactivity is polymerized by exposureto radiation.

Broadband cholesteric polarizers and methods of manufacturing same areknown per se, for example, from EP-A 0606939 (U.S. Pat. No. 5,721,603),EP-A 0606940 (U.S. Pat. No. 5,506,704) and WO 96/02016 (U.S. Pat. No.5,737,044). By means of cholesteric polarizers it is possible to convertunpolarized light to circularly polarized light in a substantiallyloss-free manner. Polarizers of this type comprise a thin layer of acholesterically (i.e. chirally nematically) ordered material. Thismaterial contains chiral, liquid-crystalline molecules having such astructure that they order themselves more or less spontaneously into aspiral-shaped or helical structure. The pitch of this helix can beincreased by adding a quantity of a non-chiral, liquid-crystalline (i.e.nematogenic) material to the chiral, liquid-crystalline material. Theexact pitch is governed by the ratio between the quantities of chiraland non-chiral liquid-crystalline molecules as well as by their chemicalstructure.

If this material is provided in the form of a thin layer on a substrateor between two substrates, the helical structure assumes such anorientation that the axis of the helix extends transversely to thelayer. Such a layer is capable of reflecting a narrow band of lightwhose wavelength corresponds to the product of the pitch and therefractive index of the material and whose direction of polarizationcorresponds to the handedness of the helical structure. By virtue ofthis property, a cholesteric layer can very suitably be used in anoptical polarizer. It is noted that the expression “the refractiveindex” of a material is to be understood to mean in this context thegeometric mean (n_(e)+n_(o))/2 of the ordinary refractive index n_(o)and the extraordinary refractive index n_(e) of this material.

Broadband cholesteric polarizers are distinguished from the customarycholesteric polarizers by the presence of a relatively broad reflectionband. The bandwidth of the customary cholesteric polarizers is onlyapproximately 40-50 nm. In the case of broadband polarizers, bandwidthsof 100 nm, 150 nm, 200 nm and even more than 400 nm have been achieved.It is noted that the band position of a cholesteric filter is defined asthe center of the wavelength range in which the reflection takes place.A width of a band is defined as the difference in wavelength between thelong-wave and the short-wave edge positions of the band. The wavelengthof an edge position is defined as the wavelength at which the intensityamounts to 50% of the maximum intensity.

EP 606940 describes an elegant method of manufacturing a broadbandcholesteric polarizer. Use is made of a mixture comprising reactivechiral monomers and reactive nematogenic monomers, which exhibit adifferent reactivity. For the reactive monomers use can be made ofcompounds containing a reactive group on the basis of acrylates, epoxycompounds, vinylethers and thiolene systems, as described, inter alia,in U.S. Pat. No. 5,188,760. Monomers containing different reactivegroups generally exhibit a different reactivity. A difference inreactivity also occurs if one type of monomers contains one reactivegroup and the other type of monomers contains two (identical) reactivegroups.

A layer of this mixture is polymerized by means of (actinic) radiation,in particular UV radiation. In this process, the conditions are selectedin such a manner that during the polymerization operation a radiationprofile of varied intensity is formed in the layer. As a result,diffusion processes take place in the cholesteric layer duringpolymerization. This leads to a variation in the composition of thehelical structure, so that the pitch, viewed across the thickness of thelayer, varies within certain limits. As a result, this cholestericpolarizer exhibits a relatively broad reflection band.

It has been found that the method described in EP-A 696940 can beimproved. The Applicant has experimentally established that smallfluctuations, for example in the radiation gradient or in the UVintensity, can strongly influence the diffusion processes of thereactive monomers. This may lead to relatively large differences in thebandwidth of the cholesteric polarizers manufactured by means of saidknown method. Therefore said known method should be improved, inparticular, with respect to the reproducible manufacture of polarizershaving a correct position of one of the two edges of the reflectionband. This applies, for example, to polarizers as described in EP-A95203209.2 (U.S. Pat. No. 5,825,444).

SUMMARY OF THE INVENTION

It is an object of the invention to improve the known method. Theinvention more particularly aims at providing a method of manufacturingbroadband cholesteric polarizers of which the position of one of the twoedges of the reflection band can be adjusted in a very reproduciblemanner. The method in accordance with the invention should enable thesepolarizers to be mass-produced.

These and other objects of the invention are achieved by substantiallyincreasing the intensity of the radiation when the band reaches adesired edge position.

The invention is based on the experimentally gained insight that theintensity of the radiation used during polymerization plays an importantpart in the manufacture of broadband polarizers. It has beendemonstrated that the eventually achieved bandwidth is governed to asubstantial degree by the radiation intensity used. If use is made of arelatively high UV intensity (typically 0.5 mW/cm² or higher), theeventually achieved bandwidth is found to be relatively small, and itdiffers hardly from that of the unpolymerized mixture. If a relativelylow radiation intensity (typically 0.05 mW/cm² or lower) is used, a muchbroader reflection band is obtained. Under these conditions, first, acolored, narrow reflection band is formed, which subsequently broadensinto an uncolored, broadband reflection band. A substantial increase ofthe intensity causes the bandwidth obtained at that instant to befrozen, as it were. It has been demonstrated that the increase inintensity should preferably be a factor of 10 or more to bring about thefrozen state. Preferably, this factor is 20 or more. Under theseconditions, the cholesterically ordered layer instantly becomecompletely polymerized.

A preferred embodiment of the method in accordance with the invention ischaracterized in that the attainment of the desired edge position of theband is determined by means of a monochromatic photosensor, thewavelength used by the sensor corresponding to the wavelength of thedesired edge position of the band. Such a photosensor comprises aphotodetector as well as a monochromatic light source. A laser can veryadvantageously be used as the monochromatic light source in the sensor.

The sensor can be used in reflection. Said sensor is constructed in sucha manner that the monochromatic light, which emanates from the lightsource and which is used in the measuring operation, is directed to thelayer to be polymerized. As long as the wavelength of the edge positionof the reflection band is not equal to that of the monochromatic light,this light will pass through the layer to be polymerized (transmission).As soon as the bandwidth assumes such a value that the two wavelengthscoincide, reflection of the monochromatic light occurs. A properpositioning of the layer, the light source and the detector causes thislight to be reflected toward the detector. At this moment, the intensityof the polymerization radiation should be increased. To this end, asecond polymerization lamp having a higher radiation intensity isactivated or, preferably, a filter situated in front of thepolymerization lamp is removed. Instead of a (mechanically) movablefilter, use can also advantageously be made of a filter whosetransmission is adjustable.

Another preferred embodiment of the method in accordance with theinvention is characterized in that the desired edge position of the bandis determined by means of a transmission measurement. For this purpose,the sensor is constructed so that the light source and the detector aresituated on either side of the layer to be polymerized. In this case,the sensor is activated as soon as the detector detects a substantialreduction in intensity of the light emanating from the light source.Such an arrangement has the advantage that the exact alignment of thelayer to be polymerized does not affect the measuring results of thesensor.

Another suitable embodiment of the method in accordance with theinvention is characterized in that the liquid crystalline,cholesterically ordered layer is passed through an illumination tunnelwhich is provided with a number of compartments which comprise aradiation source as well as a light sensor by means of which theintensity of the radiation incident on the layer can be changed. Thisembodiment enables broadband, cholesteric polarizers to be manufacturedin a continuous process. This has a favorable effect on the cost priceper unit area.

The invention also relates to a device for manufacturing a broadbandcholesteric polarizer, which is characterized by a radiation compartmentcomprising

a) means for positioning the polarizer to be manufactured,

b) a radiation source for the irradiation of the polarizer to bemanufactured and

c) a monochromatic photosensor comprising a photodetector as well as amonochromatic light source.

This device in accordance with the invention enables broadbandpolarizers to be manufactured in batch processes. Preferably, thephotodetector and the monochromatic light source are positioned in theradiation compartment in such a manner that the sensor measures in thetransmission. To this end, the polarizer to be manufactured is situatedbetween the detector and the light source during operation of thedevice.

Another device in accordance with the invention, which is used tomanufacture a broadband cholesteric polarizer, is characterized in thatthe device comprises a number of radiation compartments, which areprovided with

a) means for passing a substrate through the radiation compartments,

b) a radiation source for irradiating the substrate to be passed throughsaid compartments, and

c) a monochromatic photosensor which comprises a photodetector as wellas a monochromatic light source.

This device in accordance with the invention enables broadbandpolarizers to be manufactured in a continuous process. Preferably, thephotodetector and the monochromatic light source are positioned in theradiation compartments in such a manner that the sensors measure intransmission. For this purpose, the—preferably elongated—substrate to bepassed through the radiation compartments is situated between thedetector and the light source during operation of the device.

To increase the radiation intensity, use can be made, for example, of asecond radiation source having a higher intensity. This source should bedriven by the photosensor. A cheaper preferred embodiment of bothdevices in accordance with the invention is however characterized inthat the compartments comprise an optical filter which can be displacedby driving the sensor. Such a filter preferably passes 10% or less ofthe radiation produced by the lamp. It is noted that anadjustable-transmission filter can be used instead of a displaceablefilter.

These and other aspects of the invention will be apparent from andelucidated with reference to the embodiments described hereinafter.

BRIEF DESCRIPTION OF THE DRAWING

In the drawings:

FIG. 1 schematically shows a broadband cholesteric polarizer which canbe manufactured by means of the method in accordance with the invention,

FIG. 2A shows a chemical compound which is a suitable chiral monomer forpracticing the invention;

FIG. 2B shows chemical compound which is a suitable nematogenic monomerfor practicing the invention;

FIG. 2C shows a chemical compound which is a suitable photoinitiator forpracticing the invention;

FIG. 2D shows a chemical compound which is a suitable stablizier forpracticing the invention;

FIG. 2E shows a chemical compound which is a suitable dye for practicingthe present invention.

FIG. 3 schematically shows a first device in accordance with theinvention, which can be used to carry out the method according to theinvention,

FIG. 4 schematically shows a second device in accordance with theinvention, which can be used to carry out the method according to theinvention.

It is noted that the Figures are not drawn to scale.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

FIG. 1 shows an embodiment of a broadband cholesteric polarizer which ismanufactured by means of the method according to the invention. Thispolarizer comprises two flat, transparent substrates 1 and 2, which aremade, for example, of glass and which are positioned substantiallyparallel to each other and at some distance from each other. The facingsurfaces of the substrates are provided with an orientation layer 3 and4, for example, of rubbed polyimide or sputtered SiO_(x). A spacer 5 isprovided at the edges of the substrates.

A layer 6 of a cholesterically ordered polymeric material is situatedbetween the two substrates. The axis of the molecular helix of thecholesterically ordered material extends transversely to the layer. Themolecular helix has a variable pitch which increases continuously fromone surface of layer 6 to the other surface. This is schematically shownby means of two spiral-shaped structures 7. The thickness of layer 6typically ranges from 3 to 40 micrometers, preferably from 5 to 25micrometers.

The above-described embodiment of the cholesteric polarizer inaccordance with the invention was manufactured as follows. First, amixture containing reactive monomers was prepared. This mixturecontained 35 wt. % of the chiral monomer shown in FIG. 2A and 65 wt. %of the nematogenic monomer shown in FIG 2B. The chiral monomer containsone reactive group per molecule and the nematogenic monomer contains tworeactive groups per molecule. In this case, acrylate groups were used.The difference in reactivity between both monomers can be attributed tothe different number of reactive groups per molecule. Subsequently, 2wt. % of the photoinitiator Irgacure 651 (Ciba Geigy; structural formulashown in FIG. 2C) and 0.001 wt. % p-methoxyphenol (stabilizer;structural formula shown in FIG. 2D) as well as 1 wt. % of a dye(structural formula shown in FIG. 2E) were added to this mixture. Thisdye exhibits an absorption maximum around 334 nm and an extinctioncoefficient of 31524 l/mol.cm. This dye enables the intensity gradientof the radiation used to be set more easily. This is described ingreater detail in EP 606.940.

The mixture thus prepared was subsequently provided between twotransparent substrates. These substrates were provided with a layer of arubbed polyimide.

These layers serve to improve the alignment of the molecular helix,which develops spontaneously in the cholesteric mixture. It is notabsolutely necessary to use substrates which are provided withorientation layers. In the manufacture of (very) thin optically activelayers, generally spontaneous orientation of the chiral and nematogrenicgroups takes place. However, the presence of orientation layers duringpolymerization does lead to an improved orientation of the opticallyactive layer, so that the optical properties of the polarizers areimproved substantially.

The polymerization of the cholesteric layer will be explained in greaterdetail by means of the schematic, sectional view of the inventive deviceshown in FIG. 3. This device comprises a radiation compartment 11. Thisis provided with means for positioning the broadband cholestericpolarizer to be manufactured. In the device shown, these means areconstructed as support bodies 12. In the present case, the polarizercomprises two substrates 13 and a cholesterically ordered layer 14situated between the substrates. It is noted that the method and devicein accordance with the invention can also be used to manufacturepolarizers in which only one substrate is used.

Compartment 11 further comprises a radiation source in the form of an UVlamp. The power of the lamp and the distance between the lamp and thepolarizer to be irradiated are selected in such a manner that theaverage illumination intensity to which the cholesteric layer is exposedduring operation of the device is approximately 0.9 mW/cm². Aneutral-density filter 16 whose position or transmission is adjustableis arranged between the UV lamp and the polarizer. When the filteroperates at maximum capacity, the radiation originating from the UV lampis filtered in such a manner that the average illumination intensity onthe polarizer is only approximately 0.03 mW/cm².

Compartment 11 also comprises a photosensor which consists of amonochromatic light source 17 in the form of a laser and of aphotodetector 18. The wavelength of the laser is selected to be suchthat it is equal to the edge position of the broadband polarizer to bemanufactured. The sensor measures in transmission, so that the detectorand the light source are situated on opposite sides of the polarizerwhich is the subject of measurements. The sensor is coupled to thefilter 16. As soon as the transmission of the polarizer decreasessubstantially (50% or more) during illumination, the sensor supplies asignal which causes the neutral density filter 16 to be activated.Depending on the type of filter, this is either removed from itsposition between the radiation source 15 and the polarizer or thetransmission of the filter is maximized. By virtue thereof, theradiation intensity on the polarizer increases by a factor of 30, whichresults in the instantaneous, complete polymerization of the cholestericlayer. As a result, the bandwidth as well as the exact position of oneof the band edges is defined.

FIG. 4 is a schematic, sectional view of a device in accordance with theinvention for mass-producing broadband cholesteric polarizers. Thisdevice comprises a temperature-controlled radiation tunnel 21 whichaccommodates a number of radiation compartments 22. The radiation tunnelis provided with feed means, for example in the form of drivable rollers23, enabling an elongated, flexible substrate 24 to be continuously fedthrough. This substrate may consist, for example, of a thin, transparentfoil carrying a cholesterically ordered layer of a mixture of reactive,liquid-crystalline monomers to be polymerized.

The compartments 22 are each provided with a radiation source 25, forexample in the form of an UV lamp which is used to irradiate thesubstrate while it is being fed through the radiation tunnel 21. Anumber of the compartments 22 are provided with a photodetector 26 andwith a monochromatic light source in the form of a single laser 27. Inthe present case, the partially transmissive mirrors 28 divide the laserbeam of laser 27 into a number of deflecting sub-beams which areincident on the photodetector via the substrate.

The method in accordance with the invention can be applied continuouslyby providing a substrate which is transparent to the laser light usedwith a cholesterically ordered layer of a liquid-crystalline material.This substrate is passed through the radiation tunnel by drive means. Inthis process, the substrate is fed past a number of radiationcompartments in which it is exposed to an UV lamp of a relatively lowintensity (0.05 mW/cm² or less).

At a given moment, the reflection band will have reached such a width,as a result of the polymerization process, that the wavelength of one ofthe edge positions is equal to that of the laser used. At that moment,the intensity measured by the photodetector is reduced substantially. Asignal is then given which causes the radiation intensity to beincreased substantially, for example, by a factor of 10 or more. As aresult, instantaneous, complete polymerization of the liquid-crystallinematerial takes place, so that the measured edge position and bandwidthbecome frozen, as it were. The egressing substrate with the polymerized,broadband, cholesterically ordered layer can be processed further, in amanner which is well-known to those skilled in the art, to form abroadband cholesteric polarizer. To this end, the substrate is cut tothe proper dimensions and, if necessary, provided with a quarter lambdafoil if the transmitted light should be circularly polarized. Ifnecessary, the contrast can be increased by providing the filter with adichroic polarization foil.

The method in accordance with the invention enables broadbandcholesteric polarizers having an accurately adjusted edge position to bemanufactured. By virtue thereof, the viewing-angle dependence of adisplay provided with such a polarizer can be reduced. By means of thedevices in accordance with the invention, the polarizers can be producedin batch processes or continuous processes.

What is claimed is:
 1. A device for manufacturing a broadbandcholesteric polarizer, the device comprising a radiation compartmenthaving a) means for positioning a layer of reactive material, and b) aradiation source for irradiating the layer of reactive material,characterized in that the device further comprises c) a monochromaticphotosensor comprising a monochromatic light source arranged at a firstside of said layer to direct a monochromatic beam of light of a givenwavelength toward said layer, and a photodetector arranged at a secondside of said layer to detect the intensity of light of said givenwavelength coming from said layer.
 2. A device as claimed in claim 1,further comprising an optical filter arranged between the radiationsource and the layer, said optical filter passing at most 10% of theradiation from said radiation source, and said optical filter beingdisplaceable by the photodetector.
 3. A device as claimed in claim 1,further comprising an optical filter arranged between the radiationsource and the layer, said optical filter having a transmission which isadjustable by said photodetector, at maximum filtering said opticalfilter passing at most 10% of the radiation from said radiation source.4. A device as claimed in claim 1, characterized in that said secondside and said first side are a same side, said photodetector detectingthe intensity of light of said given wavelength reflected by said layer.5. A device as claimed in claim 4, characterized in that said devicecomprises means for controlling the intensity of radiation from saidradiation source to which the layer is exposed, and said photodetectorcomprises means, responsive to an increase in the detected intensity ofthe reflected light, for increasing the intensity of irradiation towhich the layer is exposed.
 6. A device as claimed in claim 1,characterized in that said second side is opposite to said first side,and said photodetector detects the intensity of light of said givenwavelength transmitted through said layer.
 7. A device as claimed inclaim 6, characterized in that said device comprises means forcontrolling the intensity of radiation from said radiation source towhich the layer is exposed, and said photodetector comprises means,responsive to a decrease in the detected intensity of said light to agiven value, for increasing the intensity of irradiation to which thelayer is exposed.
 8. A device as claimed in claim 7, characterized inthat said decrease in the detected intensity is a decrease of at least50%.
 9. A device as claimed in claim 7, characterized in that said meansfor controlling comprises an optical filter arranged between theradiation source and the layer.
 10. A device as claimed in claim 9,characterized in that said filter passes at most 10% of the radiationfrom said radiation source, and said means for increasing displaces saidfilter.
 11. A device as claimed in claim 9, characterized in that saidoptical filter has a transmission which is adjustable by saidphotodetector.
 12. A device for manufacturing a broadband cholestericpolarizer, comprising a plurality of radiation compartments, and meansfor passing a substrate through the radiation compartments, each of saidcompartments comprising a respective radiation source for irradiatingthe substrate passed through said compartments, characterized in thatthe device further comprises a monochromatic photosensor comprising amonochromatic light source arranged at a first side of said substrate todirect a monochromatic beam of light of a given wavelength into eachcompartment toward said substrate, and a respective photodetectorarranged in each compartment at a second side of said substrate todetect the intensity of light of said given wavelength coming from saidsubstrate.
 13. A device as claimed in claim 12, further comprising anoptical filter arranged between the radiation source and the substrate,said optical filter being displaceable by the photodetector.
 14. Adevice as claimed in claim 12, further comprising an optical filterarranged between the radiation source and the substrate, said opticalfilter having a transmission which is adjustable by said photodetector.15. A device as claimed in claim 12, characterized in that said secondside and said first side are a same side, each respective photodetectordetecting the intensity of light of said given wavelength reflected bysaid substrate, said device comprises means for respectively controllingthe intensity of radiation from each respective radiation source towhich the layer is exposed, and each photodetector comprises means,responsive to an increase in the detected intensity of the reflectedlight, for increasing the intensity of irradiation to which thesubstrate in the respective compartment is exposed.
 16. A device asclaimed in claim 12, characterized in that said second side is oppositeto said first side, and each said photodetector detects the intensity oflight of said given wavelength transmitted through said substrate.
 17. Adevice as claimed in claim 16, characterized in that said devicecomprises means for controlling the intensity of radiation from therespective radiation sources to which the substrate is exposed, and eachrespective photodetector comprises means, responsive to a decrease inthe detected intensity of said light to a given value, for increasingthe intensity of irradiation in the corresponding compartment.
 18. Adevice as claimed in claim 17, characterized in that said means forcontrolling comprises an optical filter arranged between the radiationsource and the substrate.
 19. A device as claimed in claim 18,characterized in that said filter passes at most 10% of the radiationfrom said radiation source, and said means for increasing displaces saidfilter.
 20. A device as claimed in claim 18, characterized in that saidoptical filter has a transmission which is adjustable by saidphotodetector.